Atomic Layer Etching

Authored by: Sebastian U. Engelmann

Encyclopedia of Plasma Technology

Print publication date:  December  2016
Online publication date:  December  2016

Print ISBN: 9781466500594
eBook ISBN: 9781351204958
Adobe ISBN:

10.1081/E-EPLT-120049598

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Abstract

Semiconductor technology has continuously pushed plasma etch technology to better performance and higher precision. The advent of ×1-nm technology nodes is inadvertently demanding etch processes with control in single nanometer scale dimensions. The ever continuing trend to shrink device sizes even further and also the advent of novel materials, multicomponent materials, or even nanoscale materials is growing the need for the ultimate etch solution: etching with atomic layer precision.

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