Atomic Layer Etching

Authored by: Sebastian U. Engelmann

Encyclopedia of Plasma Technology

Print publication date:  December  2016
Online publication date:  December  2016

Print ISBN: 9781466500594
eBook ISBN: 9781351204958
Adobe ISBN:


 Download Chapter



Semiconductor technology has continuously pushed plasma etch technology to better performance and higher precision. The advent of ×1-nm technology nodes is inadvertently demanding etch processes with control in single nanometer scale dimensions. The ever continuing trend to shrink device sizes even further and also the advent of novel materials, multicomponent materials, or even nanoscale materials is growing the need for the ultimate etch solution: etching with atomic layer precision.

Search for more...
Back to top

Use of cookies on this website

We are using cookies to provide statistics that help us give you the best experience of our site. You can find out more in our Privacy Policy. By continuing to use the site you are agreeing to our use of cookies.