Abstract

Nowadays the field of electronics, in particular the fabrication of integrated circuits, micro- and nanodevices, is dominated by various microfabrication processes, in particular by lithography technologies. These technologies are used to fabricate different-sized patterns, from the nanoscale, i.e. from few nanometres, to the mesoscale, i.e. micrometres to millimetres, which ultimately may be arranged in various architectures to create complex structures.