Multispacer Patterning: A Technology for the Nano Era

Authored by: Gianfranco. Cerofolini , Elisabetta. Romano , Paolo. Amato

6 Handbook of Nanophysics

Print publication date:  September  2010
Online publication date:  September  2010

Print ISBN: 9781420075502
eBook ISBN: 9781420075519
Adobe ISBN:

10.1201/9781420075519-21

 Download Chapter

 

Abstract

The evolution of integrated circuits (ICs) has been dominated by the idea of scaling down its basic constituent-the metal-oxide- semiconductor (MOS) field-effect transistor (FET). In turn, this has required the development of suitable lithographic techniques for its definition on smaller and smaller length scales. There are several generations of lithographic techniques, usually classified according to the technology required for the definition of the wanted features on photo- or electro-sensitive materials (resists): standard photolithography (436 nm, Hg g-line; refractive optics), deep ultraviolet (DUV) photolithography (193 nm, ArF excimer laser; refractive optics), immersion DUV photolithography (refractive optics), extreme ultraviolet (EUV) photolithography (13.5 nm, plasma-light source; reflective optics), and electron beam (EB) lithography (electron wavelength controlled by the energy, typically in the interval 10−3 to 10−2 nm).

 Cite
Search for more...
Back to top

Use of cookies on this website

We are using cookies to provide statistics that help us give you the best experience of our site. You can find out more in our Privacy Policy. By continuing to use the site you are agreeing to our use of cookies.